Particle Induced X Ray Emission – PIXE (Computers - Information Technologies)

Item ID 15326534 in Category: Computers - Information Technologies

Particle Induced X Ray Emission – PIXE
Particle Induced X-Ray Emission PIXE is a non-destructive, elemental analysis technique widely used for trace element and multi-element analysis. When charged particles collide with target atoms of a specimen, X-rays characteristic of the elements present in the sample are emitted and detected by the high-resolution silicon detector. PIXE has a high sensitivity for elements from Sodium to Uranium (ppb~ppm). It is used to analyze a diverse range of specimens, including air filters, semiconductor wafers, archeological artifacts, crystalline, and liquid proteins, thin films, coatings, food, biological samples, etc. Ion beam sources in PIXE can be configured for specific applications. Scanning ion beams are used to obtain a 2D elemental distribution, and micro ion beams are used for the focused micron-scale analysis of samples. PIXE is also a complementary technique to RBS (Rutherford Backscattering Spectroscopy) and is widely used together for heavy element identification in materials. INFINITA LAB
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Target State: New Jersey Target City : Newark Last Update : Aug 14, 2023 12:39 PM Number of Views: 68	Item Owner : Infinita lab Contact Email: Contact Phone: 08888783090

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2024-05-28 (0.255 sec)