Total Reflection X-ray Fluorescence (TXRF) (Computers - Information Technologies)

Item ID 15326543 in Category: Computers - Information Technologies

Total Reflection X-ray Fluorescence (TXRF)


Total Reflection X-ray Fluorescence (TXRF)
Total Reflection X-rays Fluorescence (TXRF) utilizes total reflection of a known wavelength of primary X-Rays, to reduce background scatter and noise in the secondary emission (Fluorescence) from a targeted sample surface. This technique increases the intensity of the desired spectrum of Secondary X-Rays emitted by analyte atoms on the surface of a thin sample (~ 100 microns). In this technique, a small quantity of the sample is deposited as a thin layer on a polished sample carrier. An incident primary X-Ray beam impinges upon the sample carrier at an angle below the critical angle of Total Reflection for X-rays. The critical angle depends upon the polished carrier material and the incident X-Ray wavelength. Typical Critical angles range from 0.040 for Plexiglass at 35keV to 0.550 for Gold at 8.4 keV. The atoms in the sample, when excited by impinging primary X-rays, emit secondary X-rays (Fluorescence), which are counted and measured by a solid-state detector. The detector is placed directly above the sample at a distance of about 0.5 mm to 1 mm, to capture maximum Fluorescence radiation from the sample. The measured signal is analyzed by energy intensity, providing an energy dispersive spectrum. While measurements can be done in air, the TXRF can be performed in special chambers under vacuum or in the Helium atmosphere.

INFINITA LAB


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Target State: New Jersey
Target City : Newark
Last Update : Aug 14, 2023 12:50 PM
Number of Views: 61
Item  Owner  : Infinita lab
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